Sendai-shi, Miyagi, Japan

Shunya Ito

This inventor holds 1 USPTO granted patent. Top assignees: Shin-Etsu Chemical Ltd., Tohoku University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shunya Ito. Retrieved from https://idiyas.com/inventor/shunya-ito-na5rda0s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shunya Ito: Innovator in Imprint Mold Technology

Introduction

Shunya Ito is a notable inventor based in Sendai-shi, Miyagi, Japan. He has made significant contributions to the field of imprint mold technology, showcasing his innovative spirit and technical expertise. With a focus on practical applications, his work has the potential to impact various industries.

Latest Patents

Shunya Ito holds a patent for an "Imprint Mold, Method for Manufacturing the Same and Method for Manufacturing Reproduced Imprint Mold." This patent highlights his dedication to advancing manufacturing techniques and improving the efficiency of mold production. He has achieved 1 patent in this area, reflecting his commitment to innovation.

Career Highlights

Throughout his career, Shunya Ito has worked with prominent organizations, including Shin-Etsu Chemical Ltd. and Tohoku University. His experiences in these institutions have allowed him to refine his skills and contribute to groundbreaking research and development projects. His work has been instrumental in bridging the gap between academic research and practical applications in the industry.

Collaborations

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Conclusion

Shunya Ito's contributions to imprint mold technology exemplify the spirit of innovation and dedication to advancing manufacturing processes. His work continues to inspire future generations of inventors and researchers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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