Shunsuke Kondo

Title: Shunsuke Kondo: Innovator in Polishing Technologies

Introduction

Shunsuke Kondo is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing technologies, holding a total of 2 patents. His work focuses on developing advanced polishing liquids and methods that enhance the efficiency and effectiveness of surface polishing.

Latest Patents

Kondo's latest patents include a polishing liquid and a polishing method. The polishing liquid is designed for polishing surfaces and contains cobalt, abrasive grains, a sugar component, an acid component, and water, with a pH greater than 8.0. The polishing method utilizes a CMP polishing liquid, which polishes a substrate that includes a barrier metal, a metal film, and a silicon dioxide film. This CMP polishing liquid comprises abrasive particles, a metal oxide dissolving agent, an oxidizing agent, a water-soluble polymer, and an alkali metal ion, with a pH ranging from 7.0 to 11.0. The method ensures that the surface potentials of the abrasive particles and the metal film have the same sign, optimizing the polishing process.

Career Highlights

Shunsuke Kondo is currently employed at Showa Denko Materials Co., Ltd. His innovative work in polishing technologies has positioned him as a key figure in the industry. His patents reflect a deep understanding of materials science and engineering, contributing to advancements in the field.

Collaborations

Kondo collaborates with talented coworkers, including Yuya Otsuka and Keisuke Inoue. Their combined expertise fosters a creative environment that drives innovation in polishing technologies.

Conclusion

Shunsuke Kondo's contributions to polishing technologies through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the industry and pave the way for future advancements in surface polishing methods.