Shunro Fuke

Title: Shunro Fuke: Innovator in Photoelectric Surface Technology

Introduction

Shunro Fuke is a prominent inventor based in Hamamatsu, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of photoelectric surface members. With a total of 7 patents to his name, Fuke's work has advanced the efficiency and functionality of various semiconductor applications.

Latest Patents

Fuke's latest patents include innovative processes and products aimed at enhancing quantum efficiency in photoelectric surface members. One notable patent is for a process for producing a layered member, which involves a crystalline layer formed by a nitride type semiconductor material. This photoelectric surface member is designed to improve quantum efficiency by utilizing a nitride semiconductor crystal layer with specific directional properties. Another significant patent is for a semiconductor photocathode that features an AlGaN layer bonded to a glass substrate. This invention includes a semiconductor superlattice structure that optimizes performance through a carefully designed composition ratio of aluminum.

Career Highlights

Throughout his career, Shunro Fuke has worked with notable organizations such as Hamamatsu Photonics K.K. and Shizuoka University. His experience in these institutions has allowed him to collaborate on various research projects and contribute to advancements in semiconductor technology.

Collaborations

Fuke has collaborated with esteemed colleagues, including Masatomo Sumiya and Tokuaki Nihashi. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Shunro Fuke's contributions to the field of semiconductor technology are noteworthy. His innovative patents and collaborations have significantly impacted the efficiency of photoelectric surface members. His work continues to inspire advancements in the industry.