Shugo Nitta

Title: Shugo Nitta: Innovator in Vapor Phase Epitaxy Technology

Introduction

Shugo Nitta is a prominent inventor based in Kiyosu, Japan. He has made significant contributions to the field of vapor phase epitaxy, holding a total of 7 patents. His innovative work has advanced the technology used in semiconductor manufacturing.

Latest Patents

One of Nitta's latest patents is a vapor phase epitaxial growth device. This device comprises a reactor vessel and a wafer holder arranged within the reactor vessel. The wafer holder includes a wafer holding surface configured to hold a wafer with a wafer surface oriented substantially vertically downward. The device features a first material gas supply pipe configured to supply a first material gas and arranged below the wafer holding surface. Additionally, it includes a second material gas supply pipe for supplying a second material gas and a gas exhaust pipe for exhausting gases, both arranged below the wafer holding surface. Notably, the distance between the gas exhaust pipe and an axis line passing through the center of the wafer holding surface is greater than the distances between the axis line and each of the first and second material gas supply pipes.

Another significant patent is for a gallium nitride vapor phase epitaxy apparatus. This apparatus is capable of doping magnesium and is used in vapor phase epitaxy without using organic metal as a gallium raw material. It comprises a reactor vessel and a wafer holder, along with multiple raw material gas supply pipes for gallium, nitrogen, and magnesium. The apparatus also includes a first heating unit designed to heat the magnesium-based oxide in a specific temperature range.

Career Highlights

Shugo Nitta has worked with notable companies such as Toyoda Gosei Co., Ltd. and the Tokai National Higher Education and Research System. His experience in these organizations has contributed to his expertise in vapor phase epitaxy technology.

Collaborations

Nitta has collaborated with esteemed colleagues, including Naoki Fujimoto and Hiroshi Amano. Their joint efforts have furthered advancements in the field of semiconductor technology.

Conclusion

Shugo Nitta's innovative contributions to vapor phase epitaxy technology have established him as a key figure in the semiconductor industry. His patents reflect a commitment to advancing manufacturing processes and enhancing the capabilities of semiconductor devices.