Suzhou, China

Shuao Wang

USPTO Granted Patents = 5 

Average Co-Inventor Count = 3.3

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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5 patents (USPTO):Explore Patents

Title: Innovations of Shuao Wang

Introduction

Shuao Wang is a prominent inventor based in Suzhou, China. He has made significant contributions to the field of materials science, particularly in the development of two-dimensional chalcogenides and porous crystalline materials. With a total of 5 patents to his name, Wang's work is recognized for its innovative approaches and practical applications.

Latest Patents

Wang's latest patents include groundbreaking inventions such as a two-dimensional chalcogenide and a method for preparing porous crystalline materials using ionization radiation sources. The two-dimensional chalcogenide is a crystalline material with a chemical formula of (NH)[SnS]·(CHN), featuring specific cell parameters and a unique space group. This invention is particularly notable for its ability to adsorb iodine vapor at various concentrations, making it useful in environmental applications. Additionally, his work on using ionization radiation for the preparation of porous crystalline materials offers a low-cost and environmentally friendly synthesis method, eliminating the need for heating and reducing energy consumption.

Career Highlights

Shuao Wang is affiliated with Soochow University, where he conducts research and develops innovative materials. His academic background and research focus have positioned him as a key figure in the field of materials science. Wang's inventions not only contribute to scientific knowledge but also have practical implications in various industries.

Collaborations

Wang has collaborated with notable colleagues such as Mingxing Zhang and Junchang Chen. These partnerships have enhanced his research efforts and led to the successful development of his patented technologies.

Conclusion

Shuao Wang's contributions to the field of materials science through his innovative patents demonstrate his commitment to advancing technology and addressing real-world challenges. His work continues to inspire future research and development in the area of advanced materials.

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