Shuaijie Chi

Title: Shuaijie Chi: Innovator in Semiconductor Technology

Introduction

Shuaijie Chi is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Shuaijie Chi holds a patent for a semiconductor structure and its fabrication method. This patent describes a semiconductor that includes a substrate, a gate structure on the substrate, and a dielectric layer that covers the sidewall surfaces of the gate structure. The dielectric layer features an opening that passes through the gate structure in a direction perpendicular to the extending direction of the gate structure. Additionally, the semiconductor structure includes a first isolation layer within the opening, with a top surface that is lower than the top surface of the gate structure.

Career Highlights

Throughout his career, Shuaijie Chi has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International (Shanghai) Corporation and Semiconductor Manufacturing International (Beijing) Corporation. His work in these organizations has contributed to advancements in semiconductor manufacturing processes.

Collaborations

Shuaijie Chi has collaborated with several professionals in his field, including Haiyang Zhang and Ermin Chong. These collaborations have likely enhanced his research and development efforts in semiconductor technology.

Conclusion

Shuaijie Chi is a key figure in the semiconductor industry, with a focus on innovative structures and fabrication methods. His contributions continue to influence the field and pave the way for future advancements.