Shozo Miyazawa

Title: The Innovations of Shozo Miyazawa

Introduction

Shozo Miyazawa is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of photosensitive resin compositions, holding a total of 3 patents. His work has been instrumental in advancing technologies used in photolithography and related applications.

Latest Patents

Miyazawa's latest patents include a water-soluble photosensitive resin composition and a method of forming it. This improved composition features a high-polymer compound and a water-soluble polymer, which can be polyvinylpyrrolidone or a copolymer of vinylpyrrolidone and vinylimidazole. The composition is designed for application to substrates, where it is exposed through a mask pattern and developed to create a photocured pattern. This innovative approach allows for efficient formation of photocured patterns with high sensitivity, using shorter exposure times and lower intensities. Additionally, the composition adheres strongly to glass substrates, ensuring faithful pattern formation.

Another significant patent involves an undercoating material for photosensitive resins. This undercoating composition is derived from a condensation product of a hydroxy-substituted diphenylamine and a melamine compound. The resulting undercoating layer is highly resistant to overcoating solutions, greatly improving the fidelity of pattern reproduction in photolithographic techniques.

Career Highlights

Throughout his career, Shozo Miyazawa has worked with prominent companies such as Tokyo Ohka Kogyo Co., Ltd. and BASF Aktiengesellschaft. His experience in these organizations has contributed to his expertise in the development of advanced materials for photolithography.

Collaborations

Miyazawa has collaborated with notable coworkers, including Wataru Ishii and Shinji Tsuchiya. These partnerships have likely enhanced his research and development efforts in the field of photosensitive materials.

Conclusion

Shozo Miyazawa's contributions to the field of photosensitive resin compositions have had a lasting impact on photolithography technologies. His innovative patents and collaborations reflect his dedication to advancing this important area of research.