Saga, Japan

Shouri Mokuo

This inventor holds 1 USPTO granted patent. Top assignees: Tokyo Electron Limited, Tokyo Electron Saga Limited. Active years: 1994.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Shouri Mokuo: Innovator in Wafer Washing Technology

Introduction

Shouri Mokuo is a notable inventor based in Saga, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of wafer washing systems. His innovative approach has led to the development of a unique processing vessel designed to enhance the efficiency of wafer cleaning processes.

Latest Patents

Mokuo holds a patent for a "Processing vessel for a wafer washing system." This invention is specifically designed for washing multiple wafers simultaneously. The processing vessel features a washing solution supply source, a circulation pump, and a filter. It includes a main vessel portion with inlets at the bottom, a boat for holding the wafers, and a flow control assembly. The flow control assembly is equipped with a scattering plate that disperses the washing solution horizontally and guiding passages that ensure a laminar flow, allowing the washing solution to effectively reach the spaces between adjacent wafers. This design optimizes the cleaning process by reducing the flow of washing solution around the periphery of the wafers.

Career Highlights

Throughout his career, Shouri Mokuo has worked with prominent companies in the semiconductor industry. He has been associated with Tokyo Electron Limited and Tokyo Electron Saga Limited, where he has contributed to advancements in wafer processing technologies. His experience in these organizations has provided him with a solid foundation in the technical aspects of semiconductor manufacturing.

Collaborations

Mokuo has collaborated with several talented individuals in his field. Notable coworkers include Kenji Yokomizo and Osamu Tanaka, who have worked alongside him on various projects related to wafer processing and cleaning technologies.

Conclusion

Shouri Mokuo's innovative contributions to wafer washing technology demonstrate his commitment to improving semiconductor manufacturing processes. His patent for a processing vessel highlights his expertise and dedication to enhancing efficiency in the industry.

Profile summary based on public USPTO records.
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