Shouji Tochishita

Title: Shouji Tochishita: Innovator in Semiconductor Manufacturing

Introduction

Shouji Tochishita is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Tochishita's latest patents include a method of manufacturing a semiconductor device. This method involves a semiconductor wafer with a main surface that includes a device chip area, a peripheral area, and a blank area. The process consists of coating the entire main surface with a positive photosensitive resist, defining an additional exposure area, and conducting multiple exposure processes to create a resist pattern. The final steps involve dry-etching the main surface using the resist pattern as a mask.

Another significant patent involves a semiconductor wafer that features a substrate with multiple device chip areas and scribe lines. This design includes a blank area with an alignment mark for precise alignment during manufacturing. The innovative layout ensures that the alignment mark does not interfere with the scribe area, enhancing the overall manufacturing process.

Career Highlights

Shouji Tochishita is currently employed at Ricoh Company, Ltd., where he continues to develop and refine semiconductor technologies. His expertise in this field has positioned him as a key player in advancing semiconductor manufacturing techniques.

Collaborations

Tochishita has collaborated with notable coworkers, including Tohru Haruki and Kenji Nishihara. Their combined efforts contribute to the innovative projects at Ricoh Company, Ltd.

Conclusion

Shouji Tochishita's contributions to semiconductor manufacturing through his patents and collaborative efforts highlight his role as an influential inventor in the industry. His work continues to pave the way for advancements in semiconductor technology.