Ibaraki, Japan

Shouichi Sasaki


Average Co-Inventor Count = 5.2

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Ibaraki, JP (2011)
  • Hitachi, JP (2000 - 2013)

Company Filing History:


Years Active: 2000-2013

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: Shouichi Sasaki: Innovator in Polishing Technology

Introduction

Shouichi Sasaki is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor device manufacturing through his innovative polishing technologies. With a total of 4 patents to his name, Sasaki's work has had a profound impact on the industry.

Latest Patents

One of Sasaki's latest patents focuses on a polishing slurry and method used in the process of forming wirings for semiconductor devices. This invention provides a polishing slurry that achieves a polished surface with high flatness, even when the surface is composed of multiple substances. It effectively suppresses metal residue and scratches after polishing. The polishing slurry contains at least one surfactant or organic solvent, a metal oxide dissolving agent, and water. Additionally, it may include abrasives with surfaces modified by alkyl groups, along with a metal oxidizer, water-soluble polymer, and metal inhibitor.

Career Highlights

Sasaki is currently associated with Hitachi Chemical Company, Ltd., where he continues to develop and refine his innovative polishing technologies. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Sasaki has collaborated with notable colleagues, including Jin Amanokura and Takafumi Sakurada, to further enhance the development of polishing technologies.

Conclusion

Shouichi Sasaki's contributions to polishing technology have established him as a key figure in the semiconductor industry. His innovative approaches continue to influence the field and improve manufacturing processes.

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