Miyagi, Japan

Sho Sato

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sho Sato. Retrieved from https://idiyas.com/inventor/sho-sato-nybnnsw3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sho Sato: Inventor in Plasma Processing Technology.

Introduction

Sho Sato is an inventor associated with Miyagi, Japan, and Tokyo Electron Limited. His patent work concerns plasma-processing equipment and methods for matching electrical impedance.

Latest Patents

The provided information lists one patent for Sato: “Plasma Processing Apparatus and Matching Method.” The invention describes a chamber for plasma processing, an electrode that supplies radio-frequency power, a power supply, and a matching device connected between the supply and electrode. The power supply can provide either a modulated or continuous radio-frequency wave. During a continuous-wave period before or after switching between these waveforms, the matching device gradually changes the load impedance toward a target impedance. This approach addresses impedance matching during changes in the supplied power.

Career Highlights

Sato is associated with Tokyo Electron Limited, a company that develops semiconductor manufacturing equipment. His listed patent focuses on plasma-processing apparatus and the control of impedance as radio-frequency power changes. The provided data attributes 1 patent to him.

Collaborations

Ken Yoshida is identified as Sato’s coworker. The provided information does not specify whether Yoshida collaborated on the patent.

Conclusion

Sho Sato’s listed invention addresses radio-frequency power and impedance matching in plasma-processing equipment, reflecting his connection to semiconductor manufacturing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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