The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2026
Filed:
Feb. 15, 2021
Tokyo Electron Limited, Tokyo, JP;
Sho Sato, Miyagi, JP;
Ken Yoshida, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes a chamber in which a plasma processing is performed, an electrode that supplies a radio-frequency power to the chamber for the plasma processing; a radio-frequency power supply electrically connected to the electrode, and a matching device connected between the radio-frequency power supply and the electrode. The radio-frequency power supply supplies one of a modulated wave and a continuous wave of a radio-frequency power to the electrode. The modulated wave is generated by alternately increasing or decreasing the power level of the radio-frequency power. The matching device gradually changes a load impedance to a target impedance during a period in which the continuous wave is supplied before or after the power supplied from the radio-frequency power supply to the electrode is switched from one of the modulated wave and the continuous wave to the other.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile