Nirasaki, Japan

Sho Ichinose

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sho Ichinose. Retrieved from https://idiyas.com/inventor/sho-ichinose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sho Ichinose

Introduction

Sho Ichinose is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology. His work focuses on improving the efficiency and reliability of substrate processing apparatuses.

Latest Patents

Ichinose holds a patent for a substrate processing apparatus and substrate processing method. This innovative apparatus includes multiple processing modules that perform specific processes on substrates. It features an information display that provides real-time information about errors that occur during these processes. The display shows the substrate involved, the processing module in use, the timing of the error, and the main cause of the error.

Career Highlights

Sho Ichinose is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop advanced technologies that enhance substrate processing capabilities.

Collaborations

Ichinose collaborates with Tatsuya Mukoyama, a fellow innovator in the field. Their partnership has led to the development of cutting-edge solutions in substrate processing.

Conclusion

Sho Ichinose's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patent and ongoing work continue to influence advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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