This inventor holds 1 USPTO granted patent. Top assignee: Kla Tencor Corporation. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Shivam Agarwal: Innovator in Wafer Topography Measurement
Introduction
Shivam Agarwal is a notable inventor based in Ghaziabad, India. He has made significant contributions to the field of metrology, particularly in the area of wafer topography measurement systems. His innovative approach combines advanced technology with practical applications in semiconductor manufacturing.
Latest Patents
Shivam Agarwal holds a patent for a groundbreaking invention titled "Guided scanning electron microscopy metrology based on wafer topography." This patent describes a wafer topography measurement system that can be paired with a scanning electron microscope. The system allows for the application of a topography threshold to wafer topography data, which is obtained through the measurement system. A metrology sampling plan can then be generated, including locations in the wafer topography data that exceed the topography threshold. The scanning electron microscope utilizes this sampling plan to scan the wafer and identify defects, enhancing the efficiency and accuracy of the measurement process. He has 1 patent to his name.
Career Highlights
Shivam Agarwal is currently employed at Kla Tencor Corporation, a leading company in the field of semiconductor process control and yield management. His work at Kla Tencor has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry.
Collaborations
Shivam has collaborated with talented individuals such as Arpit Yati and Jagdish Chandra Saraswatula. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.
Conclusion
Shivam Agarwal is a prominent inventor whose work in wafer topography measurement has the potential to revolutionize the semiconductor industry. His contributions reflect a commitment to innovation and excellence in metrology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
