Ehime, Japan

Shiro Ninomiya


Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 38(Granted Patents)


Location History:

  • Tokyo, JP (2014 - 2017)
  • Ehime, JP (2015 - 2019)

Company Filing History:


Years Active: 2014-2019

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16 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Shiro Ninomiya

Introduction

Shiro Ninomiya, an accomplished inventor from Ehime, Japan, holds an impressive 16 patents to his name. His work primarily focuses on advancements in ion implantation technology, which plays a crucial role in semiconductor manufacturing. Ninomiya's innovations have significantly contributed to the efficiency and precision of ion implantation processes.

Latest Patents

Among his latest patents is the "Ion Implanter and Ion Implantation Method," which introduces a novel ion implanter designed to enhance wafer irradiation. This device features a plasma shower device that supplies electrons to the ion beam. Key components include a plasma generating chamber with an extraction opening and electrodes that operate under independently controlled voltages.

Additionally, he developed an "Ion Implantation Apparatus and Ion Implantation Method." This invention incorporates a beam scanner that provides a reciprocating beam scan according to a predefined scan waveform. It also includes a mechanical scanner that enables the wafer to reciprocate, ensuring a well-distributed two-dimensional dose amount on the wafer's surface. The control device in this system is capable of adjusting scan frequencies, thereby optimizing the ion implantation process.

Career Highlights

Shiro Ninomiya has made significant strides in his career, having worked with notable companies such as Sen Corporation and Sumitomo Heavy Industries Ion Technology Co., Ltd. His contributions to these organizations have enhanced the technological capabilities in the field of ion implantation.

Collaborations

Throughout his professional journey, Ninomiya has collaborated with esteemed coworkers, including Akihiro Ochi and Toshio Yumiyama. Their collaborative efforts have been pivotal in developing innovative solutions within the semiconductor industry.

Conclusion

Shiro Ninomiya's dedication to innovation in ion implantation technology is evident through his numerous patents and collaborative work. His contributions have not only advanced semiconductor manufacturing but have also paved the way for future innovations in the field. With a career marked by significant achievements, Ninomiya remains a prominent figure in the realm of advancements in technology.

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