The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2016

Filed:

Dec. 10, 2014
Applicant:

Sumitomo Heavy Industries Ion Technology Co., Ltd., Tokyo, JP;

Inventors:

Shiro Ninomiya, Ehime, JP;

Masateru Sato, Ehime, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 1/26 (2006.01); H01Q 1/40 (2006.01); H05H 1/46 (2006.01); H01J 37/32 (2006.01); H01Q 1/42 (2006.01); H01Q 7/00 (2006.01);
U.S. Cl.
CPC ...
H01Q 1/40 (2013.01); H01J 37/321 (2013.01); H01J 37/3211 (2013.01); H01Q 1/42 (2013.01); H01Q 1/421 (2013.01); H01Q 7/00 (2013.01); H05H 1/46 (2013.01); H05H 2001/4652 (2013.01); H05H 2001/4667 (2013.01);
Abstract

An antenna cover that protects a surface of an antenna provided in a plasma chamber and exciting an electric field with a high frequency to an inner portion of the plasma chamber is provided. In the antenna cover, the thickness of the antenna cover in at least one direction among directions orthogonal to the surface of the antenna is different according to a position on the surface, such that space dependency of an electric potential on an external surface of the antenna cover decreases. In the antenna cover, the thickness of at least one direction may be changed along an extension direction of the antenna.


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