Fuchu, Japan

Shiro Koyama


Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 167(Granted Patents)


Location History:

  • Fuchu, JP (1993 - 1997)
  • Tokyo, JP (1997)

Company Filing History:


Years Active: 1993-1997

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5 patents (USPTO):Explore Patents

Title: Shiro Koyama: Innovator in Plasma Technology

Introduction

Shiro Koyama is a notable inventor based in Fuchu, Japan, recognized for his contributions to plasma technology. With a total of five patents to his name, Koyama has made significant advancements in the field, particularly in the design and functionality of electrostatic chucks and plasma treatment apparatuses.

Latest Patents

Koyama's latest patents include a plasma treatment apparatus featuring a workpiece-side electrode grounding. This innovative design incorporates a static chuck and a workpiece push-up pin on a susceptor, which serves as one of the opposed electrodes generating plasma. The push-up pin and the susceptor are electrically connected, and a grounding circuit is integrated to discharge electric charges remaining on the susceptor. This setup effectively prevents abnormal discharging between the push-up pin and the susceptor. Another significant patent is for an electrostatic chuck, which consists of a conductive film and an insulating coat formed on a susceptor. This design allows for the generation of an electrostatic attractive force through a feeder circuit that applies voltage to the conductive film.

Career Highlights

Throughout his career, Koyama has worked with prominent companies such as Tokyo Electron Limited and Toshiba Corporation. His experience in these organizations has contributed to his expertise in plasma technology and electrostatic systems.

Collaborations

Koyama has collaborated with notable colleagues, including Kenji Ishikawa and Keiji Horioka. Their combined efforts have furthered advancements in their respective fields.

Conclusion

Shiro Koyama's innovative work in plasma technology and electrostatic systems has established him as a key figure in the industry. His patents reflect a commitment to enhancing the functionality and efficiency of plasma treatment processes.

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