Shinya Okano

Title: Shinya Okano: Innovator in Substrate Processing Technology

Introduction

Shinya Okano is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 7 patents. His innovative work focuses on enhancing the efficiency and effectiveness of heating devices and transfer systems used in various processing applications.

Latest Patents

Among his latest patents, Okano has developed a heating device designed for heating a substrate before it is transferred to a processing device. This heating device features a support unit that holds the substrate and a heating unit equipped with light-emitting elements. These elements emit light to individually heat divided regions of the substrate, ensuring that areas in contact with a transfer mechanism receive higher light outputs compared to other regions. Additionally, he has created a teaching method for a transfer device that includes a pick for holding substrates and a mapping sensor. This method involves detecting the position of the substrate's edge and setting a teaching position to facilitate accurate transfers.

Career Highlights

Shinya Okano is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to push the boundaries of substrate processing technology, contributing to advancements that benefit various sectors.

Collaborations

Okano has collaborated with notable colleagues, including Takashi Sugimoto and Hiroyuki Takahashi. Their combined expertise has fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies in their field.

Conclusion

Shinya Okano's contributions to substrate processing technology exemplify the spirit of innovation. His patents and collaborative efforts continue to influence the industry, paving the way for future advancements.