Shinya Oda

Title: Shinya Oda: Innovator in Semiconductor Technology

Introduction

Shinya Oda is a prominent inventor based in Osaka, Japan, known for his contributions to semiconductor technology. With a total of three patents to his name, Oda has made significant advancements in the field, particularly in chip design and manufacturing processes.

Latest Patents

Oda's latest patents focus on a semiconductor device and chip singulation method. This innovative semiconductor device is a chip-size-package-type that is designed for facedown mounting. It includes a semiconductor layer composed of a semiconductor substrate and a low-concentration impurity layer in contact with the upper surface of the substrate. The device features a metal layer with a thickness of at least 10 μm, along with a first and second vertical MOS transistor integrated within the semiconductor layer. Notably, the side surface of the metal layer exhibits roughness that forms vertical stripes, with a maximum height of profile greater than 1.0 μm. In a plan view, the area occupancy of the metal formation in the metal layer is limited to at most 5% within a 10-μm square region, located at least 13 μm inward from the outer edge of the semiconductor device.

Career Highlights

Throughout his career, Shinya Oda has worked with notable companies, including Nuvoton Technology Corporation Japan and Asada Iron Works Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Oda has collaborated with several professionals in the field, including Yoshihiro Matsushima and Yoshihiko Kawakami. These collaborations have further enhanced his work and contributions to semiconductor advancements.

Conclusion

Shinya Oda's innovative work in semiconductor technology has led to significant advancements in chip design and manufacturing. His patents reflect a deep understanding of the complexities involved in semiconductor devices, positioning him as a key figure in the industry.