Nirasaki, Japan

Shinya Kikuta

This inventor holds 1 USPTO granted patent. Top assignees: Tohoku University, Tokyo Electron Limited. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinya Kikuta. Retrieved from https://idiyas.com/inventor/shinya-kikuta-87a44te1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Shinya Kikuta: Innovator in Chip Component Alignment

Introduction

Shinya Kikuta is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of technology, particularly in the area of chip component alignment. His innovative approach has led to the development of a unique method that enhances the precision of chip placement on substrates.

Latest Patents

Kikuta holds a patent for a method that aligns chip components relative to a substrate using liquid. The process involves supplying a liquid to a substrate, on which a chip component is arranged. The substrate features a rectangular mounting region, and the chip component has a second surface that closely matches the shape and area of this region. The method utilizes varying wettability in different regions of the substrate to facilitate accurate alignment.

Career Highlights

Throughout his career, Shinya Kikuta has worked with prominent organizations, including Tokyo Electron Limited and Tohoku University. His experience in these institutions has allowed him to refine his skills and contribute to advancements in technology.

Collaborations

Kikuta has collaborated with esteemed colleagues such as Satohiko Hoshino and Takafumi Fukushima. These partnerships have fostered innovation and have been instrumental in the development of his patented methods.

Conclusion

Shinya Kikuta's work in chip component alignment showcases his innovative spirit and dedication to advancing technology. His contributions continue to influence the field and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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