Shinya Ikeda

Title: Shinya Ikeda: Innovator in Dry Etching Technology

Introduction

Shinya Ikeda is a notable inventor based in Ube, Japan, recognized for his contributions to the field of dry etching technology. With a total of two patents to his name, Ikeda has made significant advancements that enhance manufacturing processes in various industries.

Latest Patents

Ikeda's latest patents include a dry etching method and a dry etching agent along with a storage container designed for the etching process. The dry etching method involves plasmatizing a dry etching agent to etch silicon oxide or silicon nitride. This innovative method utilizes a dry etching agent that comprises CFI and a C2-C3 fluorine-containing linear nitrile compound, with specific concentration requirements to optimize the etching process. Additionally, he has developed a method for manufacturing a filled container, which includes a metal storage container with an inner surface made of manganese steel. This method involves fluorination and purging with inert gas to ensure the integrity of the filled container.

Career Highlights

Shinya Ikeda is currently employed at Central Glass Company, Limited, where he continues to push the boundaries of innovation in his field. His work has been instrumental in developing new technologies that improve efficiency and effectiveness in manufacturing processes.

Collaborations

Ikeda collaborates with talented coworkers such as Hiroyuki Oomori and Tatsunori Kamida, contributing to a dynamic team focused on advancing technology in their industry.

Conclusion

Shinya Ikeda's contributions to dry etching technology exemplify the impact of innovative thinking in manufacturing. His patents reflect a commitment to enhancing processes that are vital to various applications.