Osaka, Japan

Shinya Akano

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Chugai Ro Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinya Akano. Retrieved from https://idiyas.com/inventor/shinya-akano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Shinya Akano: Innovator in Plasma Processing Technology

Introduction

Shinya Akano is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to the development of a unique plasma processing apparatus.

Latest Patents

Akano holds a patent for a plasma processing apparatus. This invention is designed to bring plasma close to a processing target while effectively separating the plasma from the target. The apparatus features a chamber with a holding space for the processing target and a plasma space for plasma formation. It includes a plasma gun that emits electrons into the plasma space to create plasma, along with at least one pair of position-adjustable opposed magnets that generate a magnetic flux across the chamber.

Career Highlights

Shinya Akano is associated with Chugai Ro Co., Ltd., where he has been instrumental in advancing plasma processing technologies. His work has been recognized for its potential applications in various industries, enhancing the efficiency and effectiveness of plasma processing.

Collaborations

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Conclusion

Shinya Akano's contributions to plasma processing technology exemplify the innovative spirit of modern inventors. His patent reflects a significant advancement in the field, showcasing his expertise and commitment to technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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