The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Jun. 20, 2013
Chugai RO Co., Ltd., Osaka-shi, Osaka, JP;
Shinya Akano, Osaka, JP;
Chugai Ro Co., Ltd., Osaka, JP;
Abstract
The present invention provides a plasma processing apparatus capable of bringing plasma close to a processing target and separating the plasma from the processing target. The plasma processing apparatusaccording to the present invention has a chamber internally having a holding spacein which a processing target objectis held, and a plasma spacein which plasma is to be formed, a plasma gunfor emitting electrons into the plasma spaceto form the plasma, and at least one pair of position-adjustable opposed magnetsfor forming a magnetic flux passing across the chamber, between the holding spaceand the plasma space
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile