Chugai Ro Co., Ltd.

Shinya Akano

The present invention provides a plasma processing apparatus capable of bringing plasma close to a processing target and separating the plasma from the processing target. The plasma processing apparatusaccording to the present invention has a chamber internally having a holding spacein which a processing target objectis held, and a plasma spacein which plasma is to be formed, a plasma gunfor emitting electrons into the plasma spaceto form the plasma, and at least one pair of position-adjustable opposed magnetsfor forming a magnetic flux passing across the chamber, between the holding spaceand the plasma space

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Osaka, Japan

Shinya Akano