This inventor holds 2 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1986-1988.
Company Filing History:
Years Active: 1986-1988
Title: The Innovations of Shinji Taguchi
Introduction
Shinji Taguchi is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and reliability of CMOS semiconductor devices.
Latest Patents
One of Taguchi's latest patents is for a CMOS semiconductor device. This device features an epitaxial layer with a trench formed near the boundary between two MOS transistors. The trench is designed to increase the latch-up holding voltage beyond the supply voltage, thereby enhancing the device's resistance to noise. Another notable patent is a method of manufacturing a semiconductor device, which involves creating an impurity diffusion layer and an aluminum layer for interconnections. This method ensures effective electrical connectivity between the layers, improving the overall functionality of the semiconductor device.
Career Highlights
Shinji Taguchi is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to innovate and develop advanced semiconductor solutions that are crucial for modern electronic devices.
Collaborations
Taguchi has collaborated with notable coworkers, including Youichiro Niitsu and Homare Matsumura. Their combined expertise has contributed to the successful development of innovative semiconductor technologies.
Conclusion
Shinji Taguchi's contributions to semiconductor technology through his patents and work at Toshiba highlight his role as a key innovator in the field. His advancements continue to influence the development of reliable electronic devices.