Shinji Koiwa

Title: The Innovative Contributions of Shinji Koiwa

Introduction

Shinji Koiwa is a notable inventor based in Sakai, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and manufacturing processes of display technologies.

Latest Patents

One of Koiwa's latest patents is a laser annealing method. This method involves providing a substrate with an amorphous semiconductor film and selectively irradiating it with laser light. The process includes forming two molten regions that are congruent and arranged in line symmetry. Another important patent is for a positive type photosensitive siloxane composition. This composition is designed to create films with high heat resistance, strength, and crack resistance. It also includes an active matrix substrate that minimizes defects and allows for low-cost manufacturing while maintaining good transmittance.

Career Highlights

Throughout his career, Koiwa has worked with prominent companies such as Sakai Display Products Corporation and Az Electronic Materials. His experience in these organizations has contributed to his expertise in the development of advanced display technologies.

Collaborations

Koiwa has collaborated with notable colleagues, including Akihiro Shinozuka and Nobutake Nodera. These partnerships have further enriched his innovative endeavors in the field.

Conclusion

Shinji Koiwa's contributions to semiconductor technology and display manufacturing are noteworthy. His patents reflect a commitment to innovation and improvement in the industry.