The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2021
Filed:
Jul. 03, 2019
Applicant:
Sakai Display Products Corporation, Sakai, JP;
Inventors:
Masakazu Tanaka, Sakai, JP;
Shinji Koiwa, Sakai, JP;
Kouichi Karatani, Sakai, JP;
Akihiro Shinozuka, Sakai, JP;
Nobutake Nodera, Sakai, JP;
Takao Matsumoto, Sakai, JP;
Assignee:
SAKAI DISPLAY PRODUCTS CORPORATION, Sakai, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B23K 26/354 (2014.01); H01L 21/67 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02678 (2013.01); B23K 26/354 (2015.10); H01L 21/0268 (2013.01); H01L 21/02691 (2013.01); H01L 21/67115 (2013.01); H01L 27/1274 (2013.01);
Abstract
A laser annealing method includes: step A of providing a substrate having an amorphous semiconductor film formed on a surface thereof; and step B of selectively irradiating a portion of the amorphous semiconductor film with laser light. The step B includes a step of simultaneously forming, in the portion, two molten regions that have elongate shapes congruent to each other and are arranged in line symmetry with each other.