Sakai, Japan

Kouichi Karatani

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Sakai Display Products Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouichi Karatani. Retrieved from https://idiyas.com/inventor/kouichi-karatani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Kouichi Karatani: Innovator in Laser Annealing Technology

Introduction

Kouichi Karatani is a notable inventor based in Sakai, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative laser annealing method. His work has implications for the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Kouichi Karatani holds a patent for a laser annealing method. This method involves providing a substrate with an amorphous semiconductor film on its surface. The process includes selectively irradiating a portion of the amorphous semiconductor film with laser light. Notably, the method features the simultaneous formation of two molten regions that are congruent and arranged in line symmetry with each other.

Career Highlights

Kouichi Karatani is associated with Sakai Display Products Corporation, where he applies his expertise in semiconductor technology. His innovative approach has positioned him as a key figure in the development of advanced manufacturing techniques.

Collaborations

Kouichi collaborates with talented individuals such as Masakazu Tanaka and Shinji Koiwa. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Kouichi Karatani's contributions to laser annealing technology highlight his role as an influential inventor in the semiconductor industry. His innovative methods continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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