This inventor holds 2 USPTO granted patents. Top assignee: C.uyemura Co., Ltd.. Active years: 2012-2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012-2021
Title: Shinji Ishimaru: Innovator in X-ray Fluorescence Analysis and Electroless Nickel Plating
Introduction
Shinji Ishimaru is a notable inventor based in Osaka, Japan. He has made significant contributions to the fields of X-ray fluorescence analysis and electroless nickel plating. With a total of 2 patents, his work focuses on improving measurement methods and plating processes.
Latest Patents
Ishimaru's latest patents include an X-ray fluorescence analysis measurement method and an X-ray fluorescence analysis measurement device. The purpose of these inventions is to provide a measurement method and device capable of accurately measuring various metal concentrations in solutions containing multiple additives and metals. The method involves several steps, including determining polynomial approximations for calibration curves and correcting errors caused by additives and specific gravity differences.
Another significant patent is for an electroless nickel plating bath and method that does not contain harmful metal species. This innovative plating bath includes at least an iron ion source and an iodide ion source, which helps to stabilize the plating bath without the use of harmful materials.
Career Highlights
Shinji Ishimaru is associated with C. Uyemura Co., Ltd., where he continues to develop and refine his inventions. His work has contributed to advancements in both analytical measurement techniques and plating technologies.
Collaborations
Ishimaru has collaborated with notable coworkers, including Hiromu Inagawa and Daisuke Hashimoto. Their combined efforts have furthered the research and development of innovative solutions in their respective fields.
Conclusion
Shinji Ishimaru's contributions to X-ray fluorescence analysis and electroless nickel plating demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of complex measurement and plating processes, making him a valuable figure in the field of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile