Kumamoto, Japan

Shinichi Ikeda

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinichi Ikeda. Retrieved from https://idiyas.com/inventor/shinichi-ikeda-nrs8qhul

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shinichi Ikeda

Introduction

Shinichi Ikeda is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing systems. His innovative work has led to the development of a patented technology that enhances the efficiency of substrate processing.

Latest Patents

Ikeda holds a patent for a "Substrate processing system and substrate processing method." This system includes a carry-in/out section for cassettes that accommodate multiple substrates. It features a batch processing section that processes a wafer lot of substrates collectively while standing upright. Additionally, there is a single-wafer processing section that processes each substrate individually in a horizontal state. The interface section of the system is designed to deliver substrates from the batch processing section to the single-wafer processing section, incorporating a standby table that holds substrates in contact with pure water.

Career Highlights

Shinichi Ikeda is associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work at the company has been instrumental in advancing substrate processing technologies. With a focus on innovation, Ikeda continues to contribute to the development of efficient processing systems.

Collaborations

Ikeda has collaborated with notable colleagues such as Keita Hirase and Yukiyoshi Saito. Their combined expertise has fostered advancements in substrate processing technologies.

Conclusion

Shinichi Ikeda's contributions to substrate processing systems exemplify the spirit of innovation in the semiconductor industry. His patented technology reflects a commitment to enhancing processing efficiency and effectiveness.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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