Kanagawa, Japan

Shinichi Funabashi


Average Co-Inventor Count = 4.3

ph-index = 4

Forward Citations = 49(Granted Patents)


Location History:

  • Kanagawa, JP (1985 - 1999)
  • Shizuoka-ken, JP (2002)

Company Filing History:


Years Active: 1985-2002

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9 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Shinichi Funabashi

Introduction

Shinichi Funabashi is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of technology, particularly in the areas of exhaust gas recovery and vacuum treatment processes. With a total of 9 patents to his name, Funabashi continues to push the boundaries of innovation.

Latest Patents

One of his latest patents is an "Exhaust gas recovery method and apparatus." This invention includes a comprehensive process that absorbs volatile organic compound gas from exhaust gas using a scrubber. The method involves freezing the water containing these compounds to concentrate them, allowing for effective separation and reuse. Another significant patent is the "Sealing apparatus for vacuum treatment of support for light-sensitive materials." This invention facilitates the continuous treatment of thin-film supports in a vacuum chamber, ensuring efficient processing while maintaining the integrity of the materials involved.

Career Highlights

Shinichi Funabashi is currently associated with Fuji Photo Film Company, Limited, where he applies his expertise in developing innovative solutions. His work has not only advanced the company's technological capabilities but has also contributed to environmental sustainability through his exhaust gas recovery methods.

Collaborations

Throughout his career, Funabashi has collaborated with esteemed colleagues such as Hiroshi Ogawa and Masatoshi Kiyama. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Shinichi Funabashi's contributions to innovation and technology are commendable. His patents reflect a commitment to improving processes and addressing environmental challenges. As he continues to innovate, his work will undoubtedly inspire future advancements in the field.

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