Company Filing History:
Years Active: 2017
Title: Shingo Takasugi: Innovator in Film Formation Technology
Introduction
Shingo Takasugi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of film formation technology. His innovative work has led to the development of a unique composition that enhances the efficiency of resist underlayer films.
Latest Patents
Shingo Takasugi holds 1 patent for his invention titled "Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound." This patent describes a composition that includes a compound represented by a specific formula and a solvent. The formula outlines various groups that can be included, such as hydrogen atoms, aryl groups, and alkyl groups, which can be substituted with functional groups to enhance performance.
Career Highlights
Takasugi is currently employed at JSR Corporation, a leading company in the materials science sector. His work at JSR Corporation has allowed him to focus on advancing technologies related to film formation and patterning methods. His expertise in this area has positioned him as a key player in the development of innovative materials.
Collaborations
Throughout his career, Shingo Takasugi has collaborated with notable colleagues, including Shin-ya Nakafuji and Fumihiro Toyokawa. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Shingo Takasugi's contributions to film formation technology exemplify the impact of innovative thinking in the field of materials science. His patent and work at JSR Corporation highlight his commitment to advancing technology and improving industrial processes.