Company Filing History:
Years Active: 2017-2025
Title: Shingo Koiwa: Innovator in Substrate Processing Technology
Introduction
Shingo Koiwa is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of seven patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing apparatuses.
Latest Patents
Koiwa's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing apparatus features an electrostatic chuck designed to attract a substrate. It includes a dielectric and an attracting electrode for drawing the substrate inside the dielectric. Additionally, it has a heater electrode for heating the substrate, an attracting power source for applying an attraction voltage, and a heating power source for applying a heater voltage. The attracting power source intelligently controls the magnitude of the attraction voltage based on the heater voltage. Another notable patent is the substrate support and plasma processing apparatus. This apparatus includes a first support area for a substrate and a second support area for a focus ring. The second support area is equipped with a lower electrode, a chuck area, and a bonding area, allowing for effective substrate handling during plasma processing.
Career Highlights
Shingo Koiwa is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative designs and patents have contributed to advancements in substrate processing technologies, making significant impacts in the field.
Collaborations
Koiwa has collaborated with notable coworkers such as Shigeru Senzaki and Michishige Saito. Their combined expertise has fostered a collaborative environment that encourages innovation and development in substrate processing technologies.
Conclusion
Shingo Koiwa's contributions to substrate processing technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing processes.