The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2017

Filed:

Nov. 06, 2014
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Shingo Koiwa, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/50 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); H01L 21/683 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); H01J 37/32697 (2013.01); H01J 37/32706 (2013.01); H01J 37/32724 (2013.01); H01J 37/32834 (2013.01); H01J 37/32844 (2013.01); H01L 21/67109 (2013.01); H01L 21/6831 (2013.01); H01L 21/6838 (2013.01); H01L 21/3065 (2013.01); Y02C 20/30 (2013.01); Y02P 70/605 (2015.11);
Abstract

A substrate processing apparatus includes an electrostatic chuck that includes a chuck electrode and electrostatically attracts a substrate; a direct voltage source that is connected to the chuck electrode and applies a voltage to the chuck electrode; and an evacuation unit that includes a rotor and discharges, via a heat transfer gas discharge pipe, a heat transfer gas supplied to a back surface of the substrate electrostatically-attracted by the electrostatic chuck. The evacuation unit is connected via a power supply line to the direct voltage source, generates regenerative power, and supplies the regenerative power to the direct voltage source.


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