Shih-Min Lu

Title: Shih-Min Lu: Innovator in Semiconductor Technology

Introduction

Shih-Min Lu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced structures that enhance device performance. With a total of 2 patents to his name, Lu continues to push the boundaries of innovation in his field.

Latest Patents

One of Shih-Min Lu's latest patents is titled "FinFET with Curved STI." This patent describes a semiconductor structure that includes a substrate with multiple fin structures. It features an isolation oxide structure positioned in the substrate between adjacent fin structures. The design incorporates a gate placed on the fin structures, along with a gate dielectric layer situated between the fin structures and the gate. Additionally, each fin structure contains a source/drain doped region. Notably, the isolation oxide structure has a concave, curved top surface, which is a key aspect of this innovative design.

Career Highlights

Shih-Min Lu is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Some of Shih-Min Lu's notable coworkers include Chi-Ying Hsieh and Chih-Jung Chen. Their collaborative efforts have further enhanced the innovative projects they undertake together.

Conclusion

In summary, Shih-Min Lu is a dedicated inventor whose work in semiconductor technology has led to significant advancements. His patents reflect his commitment to innovation and excellence in the field.