United Microelectronics Corp.

Shih-Min Lu

Chien-Hung Chen

Chih-Jung Chen

Chih-Yueh Li

Cheng-Pu Chiu

Chi-Ying Hsieh

Yung-Sung Lin

A semiconductor structure includes a substrate having a plurality of fin structures thereon, an isolation oxide structure in the substrate between adjacent two of the plurality of fin structures, a gate disposed on the plurality of fin structures, a gate dielectric layer disposed between the plurality of fin structures and the gate, and a source/drain doped region in each of the plurality of fin structures. The isolation oxide structure has a concave, curved top surface.

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Tainan, Taiwan

Shih-Min Lu