Shih-Kuei Ma

Title: Innovations by Inventor Shih-Kuei Ma

Introduction

Shih-Kuei Ma is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on improving the performance and reliability of semiconductor devices.

Latest Patents

One of his latest patents is a semiconductor device that includes a substrate, an epitaxial layer, a first sinker, a transistor, a diode unit, a first buried layer, and a second buried layer. This invention addresses the issue of high substrate current during high voltage operation by incorporating a diode unit, which prevents interference with other semiconductor devices. Another patent involves a semiconductor device and complementary metal-oxide-semiconductor field effect transistor. This device features a substrate with first type conductivity and an epitaxial layer with second type conductivity. The design effectively partitions regions within the epitaxial layer, preventing latch-up and enhancing device performance.

Career Highlights

Shih-Kuei Ma is currently employed at Episil Technologies Inc., where he continues to innovate in semiconductor technology. His expertise and inventions have contributed to advancements in the industry, making him a valuable asset to his company.

Collaborations

Some of his coworkers include Chung-Yeh Lee and Chun-Ying Yeh, who collaborate with him on various projects within the semiconductor field.

Conclusion

Shih-Kuei Ma's contributions to semiconductor technology through his patents and work at Episil Technologies Inc. highlight his role as an influential inventor in the industry. His innovations continue to shape the future of semiconductor devices.