San Jose, CA, United States of America

Shih-Jeun Fan


Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2007-2009

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5 patents (USPTO):Explore Patents

Title: Shih-Jeun Fan: Innovator in Plasma Processing Systems

Introduction

Shih-Jeun Fan is a prominent inventor based in San Jose, CA, known for his contributions to plasma processing systems. With a total of 5 patents, he has made significant advancements in targeted data collection and recipe creation methodologies.

Latest Patents

One of his latest patents is a "Targeted data collection architecture," which provides a system designed to collect processing data in a plasma processing environment. This innovative system includes a data collection host and multiple plasma processing components equipped with sensors. Each sensor implements intelligent targeted data agents that manage data collection behavior. The communication network facilitates bi-directional communication, allowing sensors to adapt their data collection methods based on information received from the data collection host.

Another notable patent is focused on "Methods and arrangement for creating recipes using best-known methods." This method enhances the creation of recipes for substrate processing by utilizing a best-known method driven recipe editor. The editor incorporates best practice specifications, known as best-known methods (BKMs), to create a structured recipe. The process involves defining rules for parameters within BKM modules, ensuring that the recipes adhere to established best practices.

Career Highlights

Shih-Jeun Fan is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work has significantly impacted the efficiency and effectiveness of plasma processing systems.

Collaborations

Throughout his career, Shih-Jeun has collaborated with notable colleagues, including Chung-Ho Huang and Chin-Chuan Chang, who have contributed to his innovative projects.

Conclusion

Shih-Jeun Fan's work in plasma processing systems exemplifies the importance of innovation in technology. His patents reflect a commitment to advancing the field and improving processing methodologies.

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