The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2009

Filed:

Sep. 28, 2006
Applicants:

Chung-ho Huang, San Jose, CA (US);

Shih-jeun Fan, San Jose, CA (US);

Inventors:

Chung-Ho Huang, San Jose, CA (US);

Shih-Jeun Fan, San Jose, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A targeted data collection system configured to collect processing data in a plasma processing system is provided. The system includes a data collection host and a plurality of plasma processing components having a plurality of sensors such that each of the plurality of plasma processing components having at least one sensor. Each of the sensors implements at least one intelligent targeted data agent that governs sensor data collection behavior. The system further includes a communication network coupling data collection host and plurality of sensors for bi-directional communication such that a given sensor of plurality of sensors receive information from data collection host pertaining to plasma processing system conditions occurring elsewhere from given sensor. Information received from data collection host causes the given sensor to collect at least a portion of the processing data in a first manner different from a second manner employed by sensor prior to receiving e information from the data collection host.


Find Patent Forward Citations

Loading…