Shih-Che Huang

Title: Innovations by Shih-Che Huang in Plasma-Based Processes

Introduction

Shih-Che Huang is an accomplished inventor based in Zhubei, Taiwan, known for his significant contributions to the field of plasma-based processes. With two patents to his name, Huang has pioneered technologies that advance the semiconductor manufacturing process, showcasing his expertise and innovative spirit.

Latest Patents

Huang's latest patents include "Devices and methods for controlling wafer uniformity in plasma-based processes" and "Baffle plate for controlling wafer uniformity and methods for making the same." The first patent describes a device utilized in plasma-based processes that features a housing defining a process chamber, alongside a gas distribution plate designed to ensure the uniform distribution of process gas within the chamber. This innovation includes strategically placed holes on the gas distribution plate, allowing for effective control over gas flow and processing.

The second patent focuses on a baffle plate designed to manage plasma distribution on a wafer. This baffle plate takes the shape of an annulus, comprising two distinct sectors with differing inner radii, contributing significantly to the control of wafer uniformity in processing.

Career Highlights

Shih-Che Huang is affiliated with Taiwan Semiconductor Manufacturing Company Limited, one of the world's leading semiconductor manufacturers. His work is pivotal in enhancing wafer processing techniques, which are critical for the fabrication of integrated circuits. Huang's innovative approaches have garnered attention in the industry, elevating his status as an influential inventor in semiconductor technology.

Collaborations

Throughout his career, Huang has collaborated with notable professionals, including colleagues Jr-Sheng Chen and An-Chi Li. Their collective expertise has played an essential role in the development and refinement of their groundbreaking patent applications, fostering a collaborative environment for innovation.

Conclusion

Shih-Che Huang exemplifies the innovative spirit of modern inventors in the semiconductor field. His patents reflect a commitment to advancing technology and improving manufacturing processes. With his contributions, he continues to shape the future of plasma-based applications, ensuring that the industry evolves with efficiency and precision.