Location History:
- Taichung, TW (1994 - 1998)
- Hsinchu, TW (2001 - 2002)
Company Filing History:
Years Active: 1994-2002
Title: Innovations of Shih-Chanh Chang
Introduction
Shih-Chanh Chang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on methods of fabricating interconnects and layers that enhance the performance and reliability of semiconductor devices.
Latest Patents
One of his latest patents is a method of fabricating vias. This invention involves providing a semiconductor substrate with a dielectric layer that has a via opening. The process includes covering the surfaces of the via opening with a conformal titanium layer formed by a sputtering process. Following this, an Al–Si–Cu alloy layer is deposited at a controlled temperature, and subsequently, an Al–Cu alloy layer fills the via opening. The final steps involve patterning these layers through photolithography and etching processes.
Another significant patent by Chang is the method of fabricating a glue layer and a barrier layer. In this process, a Ti layer is formed using collimator sputtering within the via or contact opening of the substrate. By controlling the flow of nitrogen and argon, a nitride mode TiN layer is created on the Ti layer. This structure is then treated with nitrogen RF plasma, which strengthens the nitride mode TiN layer and facilitates a reaction with the exposed Ti layer, transforming it into a TiN layer.
Career Highlights
Shih-Chanh Chang has been associated with United Microelectronics Corporation, where he has contributed to various innovative projects. His expertise in semiconductor fabrication techniques has positioned him as a key player in the industry.
Collaborations
Chang has collaborated with several talented individuals, including Water Lur and Chein-Cheng Wang, who have worked alongside him on various projects.
Conclusion
Shih-Chanh Chang's contributions to semiconductor technology through his innovative patents demonstrate his commitment to advancing the field. His work continues to influence the development of more efficient and reliable semiconductor devices.