Shih-Chang Chang

Title: Shih-Chang Chang: Innovator in Semiconductor Technology

Introduction

Shih-Chang Chang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative processes and structures that enhance semiconductor fabrication.

Latest Patents

Among his latest patents, one describes a semiconductor process that includes forming a stacked structure on a substrate. A contact etch stop layer is created to cover both the stacked structure and the substrate. Additionally, a material layer is formed on the substrate, exposing a top part of the contact etch stop layer that covers the stacked structure. This top part is then redressed. Another patent involves a resistor structure that comprises a substrate with an interfacial layer, a resistor trench formed in the interfacial layer, and at least one work function metal layer covering the trench's surface. The design also includes two metal bulks located at the ends of the resistor trench, which are adjacent to the work function metal layer, with a filler formed between the two metal bulks inside the trench.

Career Highlights

Shih-Chang Chang has worked with prominent companies in the semiconductor industry, including Quarton, Inc. and United Microelectronics Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor processes.

Collaborations

Throughout his career, Shih-Chang has collaborated with talented individuals such as Kuang-Hung Huang and Jie-Ning Yang, who is a woman. These collaborations have contributed to the advancement of his research and inventions.

Conclusion

Shih-Chang Chang is a distinguished inventor whose work in semiconductor technology has led to multiple patents and significant advancements in the field. His innovative processes and structures continue to influence the semiconductor industry.