Location History:
- Ibaraki, JP (2017)
- Hitachi, JP (2013 - 2018)
Company Filing History:
Years Active: 2013-2018
Title: Shigeru Yoshikawa: Innovator in CMP Polishing Technology
Introduction
Shigeru Yoshikawa is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. With a total of 4 patents to his name, Yoshikawa's work has advanced the efficiency and effectiveness of polishing processes in various applications.
Latest Patents
Yoshikawa's latest patents include innovative formulations and methods for polishing liquids used in CMP. One of his notable inventions is a polishing liquid that contains cerium oxide particles and water. This invention specifies the half-value width of the main peak in a powder X-ray diffraction chart, ensuring optimal performance. Another patent focuses on a polishing liquid that includes cerium oxide particles, an organic acid, and a polymer compound, with precise measurements for pH and content to enhance polishing efficiency.
Career Highlights
Shigeru Yoshikawa is currently employed at Hitachi Chemical Company, Ltd., where he continues to develop cutting-edge polishing technologies. His expertise in CMP has positioned him as a key figure in the industry, contributing to advancements that benefit various sectors.
Collaborations
Yoshikawa has collaborated with notable colleagues, including Munehiro Oota and Takaaki Tanaka. These partnerships have fostered innovation and have led to the successful development of new polishing solutions.
Conclusion
Shigeru Yoshikawa's contributions to CMP technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to shape the future of polishing processes, demonstrating the importance of innovation in this area.