The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Dec. 22, 2011
Munehiro Oota, Ibaraki, JP;
Takaaki Tanaka, Ibaraki, JP;
Toshio Takizawa, Ibaraki, JP;
Shigeru Yoshikawa, Ibaraki, JP;
Takaaki Matsumoto, Ibaraki, JP;
Takahiro Yoshikawa, Ibaraki, JP;
Takashi Shinoda, Ibaraki, JP;
Munehiro Oota, Ibaraki, JP;
Takaaki Tanaka, Ibaraki, JP;
Toshio Takizawa, Ibaraki, JP;
Shigeru Yoshikawa, Ibaraki, JP;
Takaaki Matsumoto, Ibaraki, JP;
Takahiro Yoshikawa, Ibaraki, JP;
Takashi Shinoda, Ibaraki, JP;
HITACHI CHEMICAL CO., LTD., Tokyo, JP;
Abstract
Provided is a polishing liquid including cerium oxide particles, an organic acid A, a polymer compound B having a carboxyl acid group or a carboxylate group, and water, wherein the organic acid A has at least one group selected from the group consisting of —COOM group, -Ph-OM group, —SOM group and —POMgroup, pKa of the organic acid A is less than 9, a content of the organic acid A is 0.001 to 1 mass % with respect to the total mass of the polishing liquid, and a content of the polymer compound B is 0.01 to 0.50 mass % with respect to the total mass of the polishing liquid, and pH is in the range of 4.0 to 7.0.