Kumamoto, Japan

Shigeru Moriyama

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Hitachinaka, JP (2000)
  • Koshi, JP (2015)
  • Kumamoto, JP (2002 - 2023)

Company Filing History:


Years Active: 2000-2023

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4 patents (USPTO):Explore Patents

Title: Innovations of Shigeru Moriyama: A Pioneer in Substrate Processing Technology

Introduction: Shigeru Moriyama is an accomplished inventor based in Kumamoto, Japan, known for his significant contributions to substrate processing technology. With a total of four patents to his name, Moriyama has played a crucial role in advancing methods that enhance the efficiency and effectiveness of substrate processing in various industries.

Latest Patents: Among Shigeru Moriyama's notable patents are two groundbreaking innovations. The first is a substrate processing method and apparatus that innovatively utilizes a substrate holding unit, designed to rotate the substrate during processing. This method involves a sequence of steps which includes positioning a top plate above the substrate, supplying a processing liquid, and incorporating a rinsing liquid to wash both the substrate and the top plate effectively. The second patent is for a local exposure apparatus, which aims to perform exposure processing on specific areas of a photosensitive film laid on a substrate. This apparatus consists of a substrate conveyor, an exposure processing chamber, and a finely controlled light source with multiple light-emitting elements. The design ensures that only the necessary parts of the light source are activated when the specific area of the film is beneath it, optimizing the exposure process.

Career Highlights: Shigeru Moriyama has worked with prominent companies in the field, including Hitachi Koki Co., Ltd. and Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills as an inventor and contribute significantly to the development of innovative technologies in substrate processing.

Collaborations: Throughout his career, Moriyama collaborated with talented individuals, including notable coworkers such as Nobuhiro Takano and Kenrou Ishimaru. Their combined expertise has potentially influenced the innovative spirit and development of the patents that Moriyama holds.

Conclusion: Shigeru Moriyama stands out as a prominent figure in the realm of substrate processing innovation. With his patents, he has made strides in improving processing methods and apparatus, which are vital for advancements in various technological applications. His ongoing contributions to the field continue to inspire future inventors and innovators.

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