The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2023
Filed:
Jul. 26, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Yoshinori Ikeda, Kumamoto, JP;
Shota Umezaki, Kumamoto, JP;
Shigeru Moriyama, Kumamoto, JP;
Ryo Yamamoto, Kumamoto, JP;
Takashi Uno, Kumamoto, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); B08B 3/10 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67393 (2013.01); B08B 3/10 (2013.01); H01L 21/02057 (2013.01); H01L 21/67028 (2013.01);
Abstract
A substrate processing method according to an embodiment of the present disclosure includes a step of holding a substrate by a substrate holding unit () which is rotatable, a step of arranging a top plate portion () above the substrate, a step of supplying a processing liquid to the substrate, and a step of supplying a rinsing liquid (Lr) between the substrate and the top plate portion () to wash the substrate and the top plate portion () with the rinsing liquid (Lr).