Tokyo, Japan

Shigemitsu Yoshie

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigemitsu Yoshie. Retrieved from https://idiyas.com/inventor/shigemitsu-yoshie

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Shigemitsu Yoshie: Innovator in Resin Technology

Introduction

Shigemitsu Yoshie is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of resin technology, particularly in the development of advanced resin compositions and structures. His innovative work has led to significant advancements in semiconductor and LED device manufacturing.

Latest Patents

Yoshie holds a patent for a resin composition that includes an epoxy resin monomer, a novolac resin, and a specialized filler. This filler is characterized by having at least four peaks in its particle size distribution, measured by laser diffractometry. The unique composition allows for enhanced performance in various applications, including semiconductor devices and LED technology.

Career Highlights

Shigemitsu Yoshie is currently employed at Hitachi Chemical Company, Ltd., where he continues to push the boundaries of resin technology. His work has been instrumental in developing materials that meet the evolving demands of modern electronics.

Collaborations

Yoshie has collaborated with notable colleagues such as Tomoo Nishiyama and Naoki Hara. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Shigemitsu Yoshie's contributions to resin technology exemplify the spirit of innovation in the field. His work not only enhances the performance of electronic devices but also paves the way for future advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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