Yamanashi, Japan

Shigehisa Hayashi

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigehisa Hayashi. Retrieved from https://idiyas.com/inventor/shigehisa-hayashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Shigehisa Hayashi: Innovator in Substrate Processing Technology

Introduction

Shigehisa Hayashi is a notable inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique information collection device that enhances the efficiency of substrate processing apparatus.

Latest Patents

Hayashi holds a patent for an "Information collection device for substrate processing apparatus." This device includes a power supply unit that operates the information collection device, an input unit connected to a sensor that detects the state of the substrate processing apparatus, a relay unit for transmitting sensor data, and a control unit that collects the sensor data. This invention is crucial for improving the monitoring and management of substrate processing operations. He has 1 patent to his name.

Career Highlights

Shigehisa Hayashi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His role involves research and development, where he applies his expertise to create innovative solutions for substrate processing.

Collaborations

Hayashi has collaborated with several talented individuals in his field, including Yutai Matsuhashi and Tsutomu Sugawara. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Shigehisa Hayashi's contributions to substrate processing technology exemplify the impact of innovation in the industry. His patent for the information collection device showcases his commitment to enhancing operational efficiency. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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