Shiaw-Rong Chen

Title: Shiaw-Rong Chen: Innovator in Semiconductor Technology

Introduction

Shiaw-Rong Chen is a prominent inventor based in Chung Ho, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent that addresses the treatment of via sidewalls in semiconductor devices.

Latest Patents

Shiaw-Rong Chen holds a patent for a method titled "Method for treating via sidewalls with hydrogen plasma." This method involves several steps, including providing a substrate with metallic wires, depositing a liner oxide layer, and applying an organic spin-on-glass layer. The process continues with the deposition of a second oxide layer, which is then planarized using a chemical-mechanical polishing method. Photolithographic and etching methods, along with oxygen plasma treatment and wet etching, are employed to form vias above the metallic layers. A hydrogen plasma treatment is performed on the via sidewalls to prevent out-gassing and enhance electrical properties. The process concludes with the deposition of a titanium/titanium nitride film, followed by aluminum or tungsten to create plugs, completing the manufacturing process.

Career Highlights

Shiaw-Rong Chen is associated with United Microelectronics Corporation, where he has been instrumental in advancing semiconductor manufacturing techniques. His work has led to improved efficiency and performance in semiconductor devices.

Collaborations

Shiaw-Rong Chen has collaborated with notable colleagues, including Jenn-Tarng Lin and Horng-Bor Lu, contributing to the development of innovative solutions in the semiconductor industry.

Conclusion

Shiaw-Rong Chen's contributions to semiconductor technology through his patented methods demonstrate his expertise and commitment to innovation. His work continues to influence the field, paving the way for advancements in semiconductor manufacturing.