Shi-Han Shann

Title: Innovations of Shi-Han Shann in Extreme Ultraviolet Lithography

Introduction

Shi-Han Shann is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of extreme ultraviolet (EUV) lithography, a critical technology in semiconductor manufacturing. With a total of three patents to his name, Shann's work focuses on enhancing the precision and efficiency of lithography systems.

Latest Patents

One of Shi-Han Shann's latest patents is titled "Target control in extreme ultraviolet lithography systems using aberration of reflection image." This innovative method involves irradiating a target droplet with EUV radiation and detecting the EUV radiation reflected by the droplet. The process includes determining the aberration of the detected EUV radiation, identifying a Zernike polynomial corresponding to the aberration, and performing corrective actions to minimize shifts in the Zernike coefficients of the polynomial. This patent represents a significant advancement in controlling EUV lithography systems.

Career Highlights

Shi-Han Shann is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in lithography technology. His work is instrumental in pushing the boundaries of semiconductor manufacturing processes, ensuring that the industry continues to evolve and meet the demands of modern technology.

Collaborations

Throughout his career, Shi-Han Shann has collaborated with several talented individuals, including Ting-Ya Cheng and Han-Lung Chang. These collaborations have fostered an environment of innovation and have contributed to the success of their projects in the field of lithography.

Conclusion

Shi-Han Shann's contributions to extreme ultraviolet lithography are noteworthy and reflect his dedication to advancing semiconductor technology. His innovative patents and collaborative efforts position him as a key figure in the industry.